SPIE Advanced Lithography + Patterning 2022

Date : 27th February 2022 to 3rd March 2022

Place : United States of America, San Jose

Website :https://SPIE.org/al_cked

Contact Person:Customer Service

Description:

SPIE Advanced Lithography + Patterning is the leading global lithography event. Attend the meeting for optical and EUV lithography, patterning technologies, metrology, and process integration for semiconductor manufacturing and adjacent applications. Hear the latest advancements where leaders come to solve challenges in lithography, patterning technologies, and materials for the semiconductor industry. SPIE Advanced Lithography + Patterning draws more than 2,000 attendees, 50 exhibitors, and 500 technical papers representing the most talented researchers and managers working in the lithography industry. Leading experts offer courses that will keep you and your team current. Featuring presentations on: + Optical and Extreme Ultraviolet (EUV) Nanolithography + DTCO and Computational Patterning + Metrology, Inspection, and Process Control + Novel Patterning Technologies + Advances in Patterning Materials and Processes + Advanced Etch Technology and Process Integration for Nanopatterning Exhibition: Advanced Lithography + Patterning Exhibition, the industry's most important event for lithography R&D, devices, tools, fabrication, and services.

SPIE Advanced Lithography + Patterning 2022 will be held in San Jose,United States of America on date 2022-03-03

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Deadline for abstracts/proposals : 1st September 2021

Keynote Speakers :

Venue :150 W San Carlos St, San Jose, CA 95113

Check the event website for more details.